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CHINESE / ENGLISH
CHINESE / ENGLISH
  • PF-300T
  • PF-200T
  • 12 inch PECVD PF-300T
    Product Introduction:
    The PF-300T PECVD system produces a family of dielectric films applied for 40-28nm node semiconductor technology. It is malleable and can be used in 14-5 nm node processing line. The Cost of Ownership (CoO) and performance indicators of PF-300T have met the high standard of international marketing requirement. The systems have been used in the production line for VLSI semiconductor manufacturing and TSV advanced packaging line in a few companies in Chinese territory and in Taiwan.
    Product Character:
    Cost of Ownership is below average and performance indicators meet the international market standard of international market requirement
    Configurable to 1-3 Process Modules
    SiO2,SiN,SiON and TEOS SiO2 standard processes are maturely available
    Configurable to 1-3 Precursors
    Low temperature(<200℃) TEOS SiO2 processes satisfied the requirement of TSV technology
    Obtained S2 and F47 certification
    Compatible and interchangeable for 8 inch PECVD system
  • 8 inch PECVD PF-200T
    Product Introduction:
    PF-200T system is based on the platform of PECVD series. It shares the hardware structure of PF-300T and it has the same level of system stability. It also passed the test of mass-production verification in major fabs in China. Comparing to the similar second hand equipments sold produced by the international maker, PF-200T system holds the advantage of higher throughput and lower maintenance cost. The Company also can provide complete service and processing development support. PF-200T offers the option to be upgraded to 12 inch configuration, or to become switchable for 8 inch or 12 inch configuration. PF-200T system also provides low temperature TEOS SiO2 processes satisfied the requirement of TSV technology in 3D ICs
    Product Characer:

    Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement

    Configurable to 1-3 Process Modules
    SiO2,SiN,SiON and TEOS SiO2 standard processes are maturely available
    Configurable to 1-3 Precursors
    Low temperature(<200℃) TEOS SiO2 processes satisfied the requirement of TSV technology
    Obtained S2 and F47 certification
    S2 and F47 standard tests certified
  • 12 inch ALD FT-300T
    Product Introduction:
    FT-300T system is an atomic layer deposition (ALD) system fully designed and developed by Piotech. Processing chamber is built on the PECVD platform, which is highly productive and mass production proven. FT-300T fully realizes and meets the demand of high productivity. FT-300T system has been applied for VLSI

    manufacturing, OLED industry, as well as advanced packaging (TSV). Since ALD technology enables a single atomic layer deposition for each processing cycle on a surface, and it could be used in sub 14nm technologies. It provides effective coverage layer to fill deep trenches and holes with high aspect ratio (AR). FT-300T systems are used to produce high quality SiO2, SiN, and Al2O3 thin films. The application of the system can be expanded into metal oxides and metal nitrides area. 

    Product Character:
    Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement
    Configurable to 1-3 Process Modules
    Excellent film uniformity and conformability

    Plasma Enhanced ALD (PEALD) and Thermal ALD (T-ALD) configuration

       available

    >95% Step coverage for high-aspect-ratio-patterned-deposition (AR>20:1)
    Obtained S2 and F47 certification
  • 12 inch 3D NAND NF-300H
    Product Introduction:
    The NF-300H system is developed specifically for the new generation 3D NAND memory fabrication. NF-300H system enables a 128-pairs of SiO2、SiN(ONON) gate stacks deposition. It combines particle contamination control, thin film roughness control, stress control and production- proven system protocol to deliver superior performance. The system achieved the above mentioned four critical indicators and peered with the similar products in the international market. It is production ready and has the competitive advantage in the market place. The Company possesses 100% intellectual property rights.
    Product Character:
    Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement
    Configurable to 1-3 Process Modules
    Consistent film quality and processing performance
    Fast switch function between processes with high- throughput
    Meet the requirements of high temperature deposition under 300-600 ℃
    Multi layer manifold showerhead design for fast precursor switch
    Obtained S2 and F47 certification
  • Technical Support Service and Spare Parts
    Customer Technical Support:

    During the warranty period, the Company will provide on time customer repair and maintenance service without charge (not including the problems caused by human errors) to assure the continuation of normal operation in customer’s production 

      site.

    During the warranty period, the Company will provide sufficient spare parts free of charge to the customer. The customer can purchase the needed spare parts from Piotech after the warranty period expires.
    Piotech guarantees that its technical support engineers will arrive customer site within 24 hours upon receiving the request from customer.
  • 12英寸单腔PECVD设备

    产品介绍: 

    SC-300以12寸PECVD设备架构为基础,专为LED生产线、高校、研究所及企业研发机构所设计研发,可做2-12英寸的工艺,可选TEOS等液态源配置,适用于半导体、MEMS、光伏,封装等行业

PF-300T

产品介绍:
Product Introduction:
The PF-300T PECVD system produces a family of dielectric films applied for 40-28nm node semiconductor technology. It is malleable and can be used in 14-5 nm node processing line. The Cost of Ownership (CoO) and performance indicators of PF-300T have met the high standard of international marketing requirement. The systems have been used in the production line for VLSI semiconductor manufacturing and TSV advanced packaging line in a few companies in Chinese territory and in Taiwan.
Product Character:
Cost of Ownership is below average and performance indicators meet the international market standard of international market requirement
Configurable to 1-3 Process Modules
SiO2,SiN,SiON and TEOS SiO2 standard processes are maturely available
Configurable to 1-3 Precursors
Low temperature(<200℃) TEOS SiO2 processes satisfied the requirement of TSV technology
Obtained S2 and F47 certification
Compatible and interchangeable for 8 inch PECVD system

PF-200T

产品介绍:
Product Introduction:
PF-200T system is based on the platform of PECVD series. It shares the hardware structure of PF-300T and it has the same level of system stability. It also passed the test of mass-production verification in major fabs in China. Comparing to the similar second hand equipments sold produced by the international maker, PF-200T system holds the advantage of higher throughput and lower maintenance cost. The Company also can provide complete service and processing development support. PF-200T offers the option to be upgraded to 12 inch configuration, or to become switchable for 8 inch or 12 inch configuration. PF-200T system also provides low temperature TEOS SiO2 processes satisfied the requirement of TSV technology in 3D ICs
Product Characer:

Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement

Configurable to 1-3 Process Modules
SiO2,SiN,SiON and TEOS SiO2 standard processes are maturely available
Configurable to 1-3 Precursors
Low temperature(<200℃) TEOS SiO2 processes satisfied the requirement of TSV technology
Obtained S2 and F47 certification
S2 and F47 standard tests certified

FT-300T

产品介绍:
Product Introduction:
FT-300T system is an atomic layer deposition (ALD) system fully designed and developed by Piotech. Processing chamber is built on the PECVD platform, which is highly productive and mass production proven. FT-300T fully realizes and meets the demand of high productivity. FT-300T system has been applied for VLSI

manufacturing, OLED industry, as well as advanced packaging (TSV). Since ALD technology enables a single atomic layer deposition for each processing cycle on a surface, and it could be used in sub 14nm technologies. It provides effective coverage layer to fill deep trenches and holes with high aspect ratio (AR). FT-300T systems are used to produce high quality SiO2, SiN, and Al2O3 thin films. The application of the system can be expanded into metal oxides and metal nitrides area. 

Product Character:
Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement
Configurable to 1-3 Process Modules
Excellent film uniformity and conformability

Plasma Enhanced ALD (PEALD) and Thermal ALD (T-ALD) configuration

   available

>95% Step coverage for high-aspect-ratio-patterned-deposition (AR>20:1)
Obtained S2 and F47 certification

NF-300H

产品介绍:
Product Introduction:
The NF-300H system is developed specifically for the new generation 3D NAND memory fabrication. NF-300H system enables a 128-pairs of SiO2、SiN(ONON) gate stacks deposition. It combines particle contamination control, thin film roughness control, stress control and production- proven system protocol to deliver superior performance. The system achieved the above mentioned four critical indicators and peered with the similar products in the international market. It is production ready and has the competitive advantage in the market place. The Company possesses 100% intellectual property rights.
Product Character:
Cost of Ownership is below average and performance indicators meet the international market standardof international market requirement
Configurable to 1-3 Process Modules
Consistent film quality and processing performance
Fast switch function between processes with high- throughput
Meet the requirements of high temperature deposition under 300-600 ℃
Multi layer manifold showerhead design for fast precursor switch
Obtained S2 and F47 certification

Technical Support S..

产品介绍:
Customer Technical Support:

During the warranty period, the Company will provide on time customer repair and maintenance service without charge (not including the problems caused by human errors) to assure the continuation of normal operation in customer’s production 

  site.

During the warranty period, the Company will provide sufficient spare parts free of charge to the customer. The customer can purchase the needed spare parts from Piotech after the warranty period expires.
Piotech guarantees that its technical support engineers will arrive customer site within 24 hours upon receiving the request from customer.

SC-300

产品介绍:

产品介绍: 

SC-300以12寸PECVD设备架构为基础,专为LED生产线、高校、研究所及企业研发机构所设计研发,可做2-12英寸的工艺,可选TEOS等液态源配置,适用于半导体、MEMS、光伏,封装等行业

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