Product Series
Product introduction

NF-300H Astra
12 inch PEALD equipment

Product Introduction
NF-300H Astra series is an atomic layer deposition equipment independently developed by our company, which can be configured with three 6-station reaction chambers. Its ALD reaction chamber is mounted on the high-capacity PECVD platform, which meets the demand for equipment capacity. It has been applied to the field of advanced chip manufacturing and advanced packaging (TSV). At the same time, it is developed for the front process (FEOL) below 14nm. Now we can provide PEALD with high quality, such as SiO2 and sin films, and successively develop metal oxide and metal nitride film processes.

 
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