Product Series
Product introduction

PF-300T Altair
12 inch Thermal ALD equipment

Product Introduction

PF-300T Altair series is the thermal atomic layer deposition equipment independently developed by our company, based on the core technologies of high-throughput PEALD system. In regards of the specifics of metal film deposition, we optimized the design of process module and key components to realize the deposition of metal film with lower cost and higher purity. The system can be used to deposit AlOx / AlN / SnOx / TiN and other metal thin films. These films are widely used in the manufacturing processes for 7nm technology nodes and below.

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