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National Science and Technology Major Project undertook by Piotech pass acceptance successfully

Date:2016年6月1日 20:08

Abstract:

            On April 15, 2016, the 11th five-year National Science and Technology Major Project "development and application of 90-65nm plasma enhanced chemical vapor deposition equipment" undertook by Piotech pass acceptance successfully in Shenyang. The project has successfully developed the 90-65nm PECVD equipment with full independent intellectual property rights for 12-inch chip production lines. Piotech CO,.LTD cooperating with SKY Technology Development and Institute of Microelectronics of Chinese Academy of Sciences study platform design of 16 inch PECVD equipment,film process,simulation calculation, equipment reliability and process repeatability, film uniformity control and radio-frequency technique. And mastered the advanced technology of  the growth of high quality thin film materials with independent intellectual property rights, applied for 307 patents, established the 10 technical standards and 5 new products, in which 12 inch production PECVD equipment won the national key new products. 

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