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  • Product Name: 12-inch PECVD equipment
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Undertake major projects in the national “Eleventh Five-year plan”
Developed independently, and with 100 percent of intellectual property right
Used for the production of 90-95 nanometer integrated circuit
Capable to extend technologically to 32 to 45 nanometers
Unique platform structure design allows the equipment to become a leading capacity in the world
Include good-quality SiO2, Si3N4, SiOxNy and SiC film making process and technology