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  • Product Name: PECVD seris equipment
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     PF-300T 12 inch PECVD equipment

     PF series are the plasma enhanced chemical vapor deposition (PECVD)equipments originally designed by Piotech, leading with differentiated intellectual property. The design and manufacturing of PF series were funded by national "Eleventh Five-Year Major 02 special" project. PF series are widely used for 40- 28 nm node IC mass production, as well as 14-10 nm node technologies exploration. The technical performance and CoO index of PF series was proved to stand for top rank among competitor equipments. PF series tools are currently serving in most fabs in midland China and Taiwan for mass production. They have run over 100 million wafers in production line of VLSI (very large scale integrated circuit)and TSV technology for advanced packaging. 

 

Features

Leading edge technology performance and CoO

1 or 3 process modules system adapted as required.

Matured and standardizedtechnology for SiO, SiN and TEOS SiO process

Up to 3 liquid draw sources configurations available

Low temperature (<200℃)TEOS SiO process designed for TEV

S2 and F47 certified

Compatibility with 8 inch substrates

 

PF-200T 8 inch PECVD equipment

 

       PF-200T series are plasma enhanced chemical vapor deposition equipments of Piotech with 100% intellectual property rights. They were developed based on PF platform models, and keep consistency with PF- 300T series on hardware structure and system stability. The PF- 200 T series have been demonstrated over numerous customer lines. The technical performance and CoO index of PF-200 T series was proved to stand for top rank in 8 inch PECVD equipment market. The PF-200 T equipment is the only 8 inch PECVD model designed for mass production. And it reflects the technological prowess of Piotech in 8-12-inch PECVD equipment RND work.