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  • Product Name: 12 inch 3D NAND equipment
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NF-300T    12 inch 3D NAND Equipment

       NF-300T series are PECVD equipments originally designed by Piotech, leading with differentiated intellectual property. The design and manufacturing of NF-300T series were funded by national "Thirteenth Five-Year Major 02 special" project, and it’s the first thin film deposition equipment designed for MP line of novel NAND flash device in China. The NF-300T series can be applied to production line of 30-20 nm node technology, and have the potential to expand further to processing technologies under 20nm node. 3D NAND manufacturing process starts with depositing multiple alternating layers of materials such as Oxide and Nitride films. Each thin layer must be highly uniform, extremely smooth and with good adhesion to subsequent layers which can help increase the 3D NAND device density.NF-300T series provides process solution for Oxide, Nitride (ON) stack with management of film particle performance, uniformity, stress, roughness, and controllable WER.The system provides solution for 3D NAND device fabrication for both advanced performance and higher through put IC manufacture.

 

Features:

Leading technology in semiconductor industry

Uniform deposition with layer to layer precision for SiO/SiN (ONON) stack

Extreme stack film stability and excellent processing performance

Quick swith function between different film with high through put

Large deposition temperature range from 300℃-600℃

Multi-layer shower head design to achieve instant gas switchS2 certified